微电子(单晶硅、多晶硅、太阳能电池、氧化铝坩埚)生产用水系统超水设备，余艳13073396006,QQ:674831270 微电子、电池工业用水处理设备 Pure water for Micro-electronics, batteries industrial 应用领域和指标要求参考 Reference of applications areas and indexes required 用途Applications 用水指标Water Indicators 参考标准Reference standard 单晶硅、多晶硅、太阳能电池、氧化铝坩埚、光伏玻璃等生产 Monocrystalline silicon, polycrystalline silicon, solar cells, alumina crucible, photovoltaic glass, and other production 电阻率15 ~18.25 MΩ.CM Resitivity15 ~18.25 MΩ.CM 我国电子级水质技术指标，GB11446-1-1997 The water quality of China’s electronic-grade technical indicators GB11446-1-1997 美国半导体工业用水指标 The industrial pure water indicators of U.S. semiconductor 单晶硅半导体集成电路块，显像管、玻壳、液晶显示器等制造工业 Monocrystalline silicon semiconductor chips, tubes, glass, liquid crystal displays and other manufacturing industries 电阻率15 ~18.25 MΩ.CM Resitivity15 ~18.25 MΩ.CM 美国半导体工业用水指标 The industrial pure water indicators of U.S. semiconductor 我国电子级水质技术指标，GB11446-1-1997 Chinese electronic-grade water quality technical specifications GB11446-1-1997 光学材料清洗用水、电子陶瓷行业用水、磁性材料用水 Pure water for optical materials, electronic ceramics and cutting-edge magnetic materials 电阻率10 ~17 MΩ.CM Resitivity10 ~17 MΩ.CM 我国电子级水质技术指标，GB11446-1-1997 Chinese electronic-grade water quality technical specifications GB11446-1-1997 美国半导体工业用水指标 The industrial pure water indicators of U.S. semiconductor 蓄电池、锂电池、锌锰电池生产 Batteries, lithium batteries, zinc-manganese battery production 电阻率5 ~10 MΩ.CM Resitivity5 ~10 MΩ.CM 我国电子级水质技术指标，GB11446-1-1997 Chinese electronic-grade water quality technical specifications GB11446-1-1997 有色金属、贵金属冶炼用水、纳米级新材料生产用水、航空新材料生产用水、ITO导电玻璃制造用水、电子级无尘布生产用水 Pure water for non-ferrous metals, precious metals smelting, nano-scale production of new materials, aviation and production of new materials, ITO conductive glass, production of electronic-grade for dust-free cloth 电阻率15 ~18.25 MΩ.CM Resitivity15 ~18.25 MΩ.CM